Kompaktowy system preparatywny (250 ml/min)

Wysokosprawny, praparatywny system HPLC zawiera detektor DAD UV-VIS, preparatywną pompę gradientową, automatyczny nawór nastrzykowy oraz kolektor frakcji. Detktor umożliwia pomiar absorbancji przy czterech długościach fali w tym samym momencie lub skanowanie w całym spektrum.
System kontrolowany jest za pomocą wbudowanego komputera z ekranem dotykowym
Modułowa konstrukcja pozwala skonfigurować jednostkę pod potrzeby klienta. System posiada detektor z długością fali w zakresie 200 - 800 nm, pompę z przepływem do 250 ml/min oraz kolektor frakcji.
Główne komponenty
It is UV-VIS diode array detector, which allow measuring absorbance of four wavelengths in range of 200–800 nm simultaneously in one cell just as scanning of whole spectra. Standardly is assembled with preparative cell PLCC07L, but other cells are available.

Fractions are collected according to chosen method, which is simply created using touch screen. Racks for 8, 21,40 ml tubes.

Valve is driven by a stepmotor and it is automatically switched by software. System also allows manual sample injection by opened column.

Installed industrial PC with Intel Atom 4 core processor. OS Linux, Touch screen 12,1“ 1024 x 786, SW QUEEN controlls: gradient, flow rate, wavelengths, fractions collection etc. Remote administration is available.

Modified for compact system, quaternary gradient pump with flow rate up to 250 ml/min (30 MPa at 100 ml/min and than linearly down up to 15 MPa at 250 ml/min). Unit software includes new learning algorithm for pulsation suppression and many testing and diagnostic functions.

Kompaktowy system preparatywny | |
Interfejsy | 3xUSB, 2xLAN, RS232 |
Napięcie zasilania | 100 - 240 V AC |
Moc wejściowa | 400 W |
Wymiary W x H x D | 500 x 678 x 482 mm (19.69 x 26.69 x 18.98") |
Waga | 55 kg |
Detektor | |
Zakres długości fali | 200 - 800 nm (256 elementów na CCD) |
Ilość kanałów (sygnałów) | 4 |
Skan | 200 - 800 nm,up to 20 Hz, krok = 1 nm |
Typical spectral half-width | 10 nm |
Accuracy of adjustment / Reproducibility | ± 1 nm / ±0.5 nm |
Noise level at test cell (254 nm, TC 0.75s) | ± 5 x 10-5 AU |
Drift at test cell (254 nm after 1 h) | 1 x 10-3 AU/hr |
Materials in contact with mobile phase | FEP; fused silica, stainless steel, PEEK |
Time constant (T63) | 0.5 s, 0.75 s, 1.0 s, 2.0 s, 4.0 s, 8.0 s, 16.0 s, 0.2 s, 0.1 s |
Fraction collector | |
EC08 48 tubes of 8 ml | |
Available racks (two racks per unit) | EC21 36 tubes of 21 ml |
EC40 24 tubes of 40 ml |
|
Maximum flow rate for tubes 8 ml |
max. 50 ml/min |
Maximum flow rate for tubes 21, 40 ml | max. 300 ml/min |
Wetted materials | FEP, Tefzel®, PPS, KEL-F, PTFE, PEEK, SS 316, glass SIMAX |
Input tubing | OD 1/8“ x ID 1/16“ FEP |
Pump | |
Flow rate | 0.5 – 250 ml/min |
Maximum operating pressure | 30 MPa (4351 PSI) up to 100 ml/min than linearly down up to |
15 MPa (1450.5 PSI) at 250 ml/min | |
Flow rate setting | 0.1 ml/min steps |
Repeatability of flow rate adjusting | ± 1 % |
Accuracy of flow rate setting | ± 2 % |
Wetted materials | stainless steel, PEEK, TefzelTM,PE, ceramic, seals * |
Output capillary outer diameter | 1/8” |
Input tubing outer diameter | 1/8” |
Gradient valves control module - OPTIONALLY | Up to six valves |